-
-
September 11, 2023 at 8:39 am
Mariah Ha
SubscriberHi ,Â
I am using Charge solver to simulate a pin diode. I would like to ask if the diffused doping parameter "distribution function" is adjustable? I mean for example when choosing a Gaussian profile , can I change the parameters of the Gaussian (sigma) itself , using the scripting language or by any other means.Â
Regards.
-
September 11, 2023 at 9:06 pm
Guilin Sun
Ansys EmployeeYes, you can, for example:
setnamed("CHARGE::back diff (p++)","junction width",3e-7);
where "back diff (p++)" is the doping object.
you can use
?getnamed("CHARGE")Â
to find all parameters for CHARGE,and
getnamed("CHARGE::objectname")
to get all the parameters for the object "objectname".
Please note that in script it uses MSK unit.
Â
-
September 12, 2023 at 3:31 am
Mariah Ha
SubscriberThank you for the reply. I meant for the parameter defining the diffused doping type (gaussian and erfc) , is it possible to modify this parameter further , like adjusting the sub parameters of the gaussian itself (this does not exist in the interface) . In other words, i would like to choose a particular shape of the gaussian by scaling a parameter "sigma" to play with the width of the gaussian . Is this possible in lumerical ? Or it stops at the level of defining the type (gaussian /erfc).Â
-
September 12, 2023 at 2:31 pm
Guilin Sun
Ansys EmployeeIt has only one size parameter as replied before. You can call it as sigma.
 it stops at the level of defining the type (gaussian /erfc): since the doping is additive, you can use a uniform doping to level the small gaussian tail. I am noste sure if you can use the opposite doping to reduce it.
Ussually there is backgroud doping. So small change of doping at the edge should not change the result significantly. You can test and verify it. There are other errors in simulation which can be larger than this small doping differece.
Â
-
- The topic ‘Diffused doping parameters adjustment’ is closed to new replies.
-
3487
-
1057
-
1051
-
955
-
917
© 2025 Copyright ANSYS, Inc. All rights reserved.