Modeling Plasma Simulation in a 2D Gaseous Electronics Conference Chamber

This tutorial demonstrates how to set up, run, and post process a plasma simulation inside a 2D Gaseous Electronics Conference (GEC) chamber using Ansys Charge Plus™ electromagnetic charging and discharge simulation software. GEC chambers are standardized reference reactors used to investigate inductively coupled plasma (ICP) behavior and are widely used for benchmarking plasma simulation tools.

You will configure plasma domain settings, define plasma species and reaction mechanisms, apply material and electromagnetic boundary conditions, generate meshes, and compare the performance of ECSim (Semi-Implicit Energy Conserving) and ChECSim (Semi-Implicit Charge and Energy Conserving) Particle-in-Cell (PIC) algorithms. The tutorial also covers simulation execution, convergence monitoring, post-processing, and interpretation of plasma density and temperature results.

Following completion of this tutorial, you will be able to:

• Explain the purpose of a GEC chamber and its role in plasma simulation benchmarking.
• Configure domain settings and advanced PIC options for plasma simulations in Ansys Charge Plus software.
• Differentiate between ECSim and ChECSim algorithms and identify appropriate use cases for each.
• Define plasma species, reactions, materials, and electromagnetic boundary conditions for a plasma chamber model.
• Create and refine meshes suitable for PIC plasma simulations.
• Execute simulations using local and Connect workflows while monitoring convergence behavior.
• Post-process and interpret plasma density, temperature, and particle behavior results.
• Evaluate the impact of solver selection and mesh resolution on simulation accuracy and computational performance.

Prerequisites:

• Ansys Charge Plus Getting Started

 Please note: These training materials were developed and tested in the 2026R1 release.