Ansys Learning Forum Forums Discuss Simulation Photonics Grating Coupler Double Etch Optimization using Gradient Based Inverse Design Reply To: Grating Coupler Double Etch Optimization using Gradient Based Inverse Design

Guilin Sun
Ansys Employee

The current model does not offer directly what you desired. You may try to modify the parameters to have binary values only, with known depths based on experience (you can change them, or have initial guess, or get help from publications), but locations are random. Or after the first round of optimization, binarize the depths and check the results to see if it significantly deviates the original optimization.

The feature for inverse design is to be expanded as different users have different optimzation rules. However the current frame work only provides one depth mechanism . More desired features are to be explored by genious scholars and engineers.

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