Time Averaged Surface Reaction Rate for a Rotating Susceptor

How to obtain the Time Averaged Surface Reaction Rate for a Rotating Susceptor

Deposition on a rotating susceptor shows the concentric circles in the actual measurement. However, it would be different when looked at the simulation results. Actual measurement is usually showing a time average over a longer period. On the other hand, simulations in Ansys Fluent are performed using Moving Wall or MRF. Since the rotating state of the susceptor corresponds to "freezing" or "snapshot" at a certain moment, instantaneous deposition rate distribution is shown in the contours. In other words, you need to compare the time averaged value from simulation with the measured values. If you use the Moving Wall and MRF, time average is equivalent to the average of the circumferential direction.

There are two methods to obtain an averaging in the circumferential direction of the deposition rate. For more details, refer to this document.